LAPLACE-SEMI

LAPLACE-SEMI

Laplace (Guangzhou) Semiconductor Technology Co., Ltd. is a leading domestic high-tech enterprise focusing on silicon carbide-based "third-generation semiconductor" thermal process equipment. It is wholly owned by Laplace New Energy Technology Co., Ltd. Subsidiary.
The company provides advanced high-end equipment and high-quality services for the semiconductor chip manufacturing process and substrate fields.
Laplace Group Size:

LAPLACE-SEMI

6

R & D and production base

40000

Production base area

3

customer service center

3000

employees

Semiconductor Equipment
Ceramic Substrate Equipment

Silicon Carbide Oxidation Furnace

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Silicon Carbide Oxidation  Furnace
Silicon Carbide Oxidation  Furnace

Vertical LPCVD Furnace

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Vertical LPCVD Furnace
Vertical LPCVD Furnace

Horizontal Multi-functional Furnace

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Horizontal Multi-functional Furnace
Horizontal Multi-functional Furnace

Ceramic Substrate Equipment

Vacuum brazing equipment

Ceramic substrate vacuum active metal brazing (AMB) and metal heat treatment

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Vacuum brazing equipment
Vacuum brazing equipment

Vacuum pressure high-temperature sintering furnace

Vacuum sintering, pressure sintering, atmosphere sintering, rapid cooling furnace

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Vacuum pressure high-temperature sintering furnace
Vacuum pressure high-temperature sintering furnace

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020-31569374
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